Description
TEL ACT 12 Wafer Edge Exposure
Tokyo Electron ACT 8 Wafer Edge Exposure(WEE) Prcss Stn
Shinwa Temperature & Humidity Controller T&H-ESA-8-T-01
Rudolph Technologies MetaPulse 200X Cu Metrology Tool
Rudolph Technologies Metrology Tool MetaPulse 200X Cu

Rudolph Technologies MetaPulse 200 Metrology Tool 200mm
Tokyo Electron ACT 12 Develop Process Station Right
Tokyo Electron ACT 12 Develop Process Station Left
Tokyo Electron ACT 8 Develop Process Station Left
Novellus Concept Two Altus Wafer Chamber CVD-W complete
Shimadzu Turbopump TMP-3403LMTC rebuilt 3620-00486
AMAT XR80 Implanter 300mm Wheel and motor 0020-99685
Tokyo Electron TEL ACT 12 Chemical
TEL ACT 8 SOG Coat Process Station Right Working




